PES 449 / PHYS 549 Physics of Thin Films

Written Project

DUE April 19, 2000

As professional scientists you will be called upon to provide peer review of other people's work. This involves critically reading a paper and providing your professional opinion of the quality of their work.

Choose a paper from the following list. These papers are all from the same journal because they tend to be shorter articles and are readily available in the UCCS library.

Write a three page, double spaced report. The report should involve about one page each on

1. overview of the paper - summarize the method and key results

2. Critical comments

For instance: What assumptions were made and how good are they? How do these assumptions limit the general applicability of the paper? Is the analysis correct? Are any factors being ignored? Were experiments performed well or were parameters left uncontrolled ? Are the experiments well enough described so that you know what was done ? . . .

3. Suggest future work (theory or experiment) that might be done to futher our understanding of the issues discussed in the paper.

 

List of papers:

  1. "W Nucleation on TiN from WF6 and SiH4" S. L. Lantz et al., J. Vac. Sci. Technol. A 12(4) 1032 (1994).
  2. "Comparison of two epitaxial formation mechanisms in the SiGe system and the subsequent defect generation" S. M. Prokes and A. K. Rai, J. Vac. Sci. Technol. A 12(4) 1148 (1994).
  3. "Dependence of material properties of RF magnetron-sputtered, Cu-doped, ZnTe films on deposition conditions" T. A. Gessert et al., J. Vac. Sci. Technol. A 12(4) 1501 (1994).
  4. "Study of ion-beam-sputtered ZnO films as a function of deposition temperature" Y. Qu et al., J. Vac. Sci. Technol. A 12(4) 1507 (1994).
  5. "Microstructural study of sputter-deposited CdTe thin films" X. Li et al., J. Vac. Sci. Technol. A 12(4) 1608 (1994).
  6. "Transition from Stranski-Krastanov to quasi-layer-by-layer growth in Pb deposition on Cu(100)" H. Zeng et al., J. Vac. Sci. Technol. A 12(4) 2058 (1994).
  7. "Heteroepitaxy of lattice-matched compound semiconductors on silicon" K. Bachman et al. J. Vac. Sci. Technol. A 13(3) 696 (1995).
  8. "Application of electron cyclotron resonance plasma source to conductive film deposition" M. Shimada et al., J. Vac. Sci. Technol. A 13(3) 815 (1995).
  9. "Fabrication of thin films with highly porous microstructures" K. Robbie et al., J. Vac. Sci. Technol. A 13(3) 1032 (1995).
  10. "Low temperature formation of textured ZnO transparent electrodes by magnetron sputtering" T. Minami et al., J. Vac. Sci. Technol. A 13(3) 1053 (1995).
  11. "Effects of deposition conditions on the fluorine and hydrogen concentration in tantalum pentoxide (Ta2O5) thin films prepared by plasma enhanced chemical vapor deposition using a tantalum pentafluoride (TaF5) source." E. Z. Luo et al., J. Vac. Sci. Technol. A 17(6), 3235 (1999).
  12. "Fine control of deposition film compositions using radio-frequency reactive sputtering with periodic gas additions" S. Kimura et al., J. Vac. Sci. Technol. A 17(6), 3312 (1999).
  13. "Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition" Q. Tang et al., J. Vac. Sci. Technol. A 17(6), 3379 (1999).
  14. "Preparation and mechanical properties of composite diamond-like thin films" Q. Wei et al., J. Vac. Sci. Technol. A 17(6), 3406 (1999).
  15. "Vapor-deposited gold film formation on highly oriented pyrolitic graphite. A transition from pseudo-two-dimensional branched island growth to continuous film formation" B. Blum et al., J. Vac. Sci. Technol. B 17(6), 2431 (1999).
  16. "Multisource plasma chemical vapor depostion for synthesis of SiNx-SiOy and SiNx-SiCy composite films" R. Nonogaki et al., J. Vac. Sci. Technol. A 18(1), 63 (2000).
  17. "Chemical vapor deposition of pyrolitic boron nitride from borazine" V. Demin et al., J. Vac. Sci. Technol. A 18(1), 94 (2000).
  18. "Growth and modification of Ag islands on hydrogen terminated Si(100) surfaces" M. J. Butcher et al., J. Vac. Sci. Technol. B 18(1), 13 (2000)