University of Colorado at Colorado Springs

Nano photonics group at UCCS

Major Equipment:

Molecular Beam Epitaxy (MBE) system equipped with:

         8 evaporation sources

         linear 4 pocket e-gun

         Reflection High Energy Electron Diffraction unit

         Low Energy Electron Diffraction unit

         Hemispherical electron detector and X-ray monochromator (Al and Ag lines)for XPS/AES Spectroscopies

         Ion Sputtering unit

         Residual Gas Analyzer unit

 Ultrahigh Vacuum Electron Beam Deposition system

         4 pocket e-gun

         Reflection High Energy Electron Diffraction unit

 

Sputtering System

         5 sputtering guns, e-gun, and RF etcher

Ion etcher

Brillouin Light Scattering (BLS) system

Timer resolved MOKE system based on 15 fs laser system (under construction)

Atomic Force Microscope with Magnetic Force Microscopy capability (Veeco system)

Size-selected clusters and cluster-based nanomaterials for nanophotonics.

Machine shop with one technician

Clean Room with optical photolithography setup

Computers, including a computer cluster

 

 

 

 

 

 

 

 

 

 

 

 

 

Facilities