Molecular Beam Epitaxy System

Specifications Growth Chamber: 8 thermal evaporation sources and linear 4 pocket e-gun Reflection High Energy Electron Diffraction Residual Gas Analyzer unit Thickness monitor Analysis Chamber: Low Energy Electron Diffraction units Auger Electron Spectroscopy and Ion Sputtering units k-Space Associate CCD Camera system (KSA400) for data acquisition of diffraction images Base pressure of 10-10 Torr Sophisticated sample manipulator with five degrees of freedom operating at 150-1000 K